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01262cam#a2200289ua#4500 |
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20060725122727.0 |
| 008 |
981006s1999####ja#a##########101#0#eng#d |
| 001 |
BCCAB008332 |
| 003 |
AR-BCCAB |
| 245 |
1 |
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|a Proceedings of the 4th International Conference on Reactive Plasmas :
|b October 19-23, 1998, Maui, Hawaii /
|c edited by A. Kono ... et al.
|
| 260 |
# |
# |
|a S.l. :
|b Organizing Committee of ICRP-3/SPP-15,
|c 1999.
|
| 300 |
# |
# |
|a xxi, 525 p. :
|b il. ;
|c 30 cm.
|
| 111 |
2 |
# |
|a ICRP-4
|d (1998 :
|c Maui, Hawaii )
|
| 700 |
1 |
# |
|a Kono, A.
|
| 710 |
2 |
# |
|a Nagoya Industrial Research Institute.
|
| 711 |
2 |
# |
|a International Conference on Reactive Plasmas
|n (4th :
|d 1998 :
|c Maui, Hawaii )
|
| 711 |
2 |
# |
|a Symposium on Plasma Processing
|n (15th :
|d 1997 :
|c Maui, Hawaii )
|
| 246 |
1 |
8 |
|a Conference proceedings, ICRP-4/SPP-15
|
| 080 |
# |
# |
|a 533.9:061.3
|
| 650 |
# |
0 |
|a Plasma engineering
|v Congresses.
|
| 650 |
# |
0 |
|a Plasma (Ionized gases)
|x Industrial applications
|v Congresses.
|
| 490 |
1 |
# |
|a Japanese Journal of Applied Physics ;
|v v. 38, 7B (1999)
|
| 504 |
# |
# |
|a Incluye referencias bibliográficas.
|
| 040 |
# |
# |
|a CUY
|c CUY
|d OCL
|b spa
|d arbccab
|
| 500 |
# |
# |
|a Incluye índice.
|
| 942 |
# |
# |
|c BK
|
| 952 |
# |
# |
|2 udc
|7 NOT_LOAN
|a ARBCCAB
|b ARBCCAB
|i 008332_nuevo-0
|o JPN. J. APPL. PHYS. 1999
|p 008332_nuevo-0
|t 1
|y BK
|
