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| LEADER |
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| 001 |
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| 008 |
901219s1990####gw#a#####b####001#0#eng## |
| 005 |
20111220145652.0 |
| 003 |
AR-BCCAB |
| 245 |
1 |
0 |
|a Ion tracks and microtechnology :
|b principles and applications /
|c Reimar Spohr ; edited by Klaus Bethge.
|
| 260 |
# |
# |
|a Braunschweig :
|b Vieweg,
|c c1990.
|
| 300 |
# |
# |
|a ix, 272 p. :
|b il. ;
|c 25 cm.
|
| 504 |
# |
# |
|a Incluye referencias bibliográficas e índice.
|
| 020 |
# |
# |
|a 3528063300
|
| 100 |
1 |
# |
|a Spohr, Reimar.
|
| 700 |
1 |
# |
|a Bethge, Klaus,
|d 1931-
|
| 650 |
# |
0 |
|a Materials
|x Effect of radiation on.
|
| 650 |
# |
0 |
|a Ion bombardment
|x Industrial applications.
|
| 650 |
# |
0 |
|a Ion beam lithography.
|
| 010 |
# |
# |
|a ###90229102#
|
| 050 |
0 |
0 |
|a TA418.6
|b .S66 1990
|
| 040 |
# |
# |
|a DLC
|c DLC
|b spa
|d arbccab
|
| 942 |
# |
# |
|c BK
|
| 952 |
# |
# |
|2 udc
|a ARBCCAB
|b ARBCCAB
|i 15804
|o 539.12 S64
|p 15804
|t 1
|y BK
|
