Fundamentals of nanoscale film analysis /
From materials science to integrated circuit development, much of modern technology is moving from the microscale toward the nanoscale. This book focuses on the fundamental physics underlying innovative techniques for analyzing surfaces and near-surfaces. New analytical techniques have emerged to me...
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New York, N.Y. ; London :
Springer,
c2007.
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| Acceso en línea: | Tapa Indice |
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| 003 | AR-BCCAB | ||
| 245 | 1 | 0 | |a Fundamentals of nanoscale film analysis / |c Terry L. Alford, Leonard C. Feldman and James W. Mayer. |
| 260 | # | # | |a New York, N.Y. ; |a London : |b Springer, |c c2007. |
| 300 | # | # | |a xiv, 336 p. : |b il. ; |c 25 cm. |
| 504 | # | # | |a Incluye referencias bibliográficas e índice. |
| 520 | # | # | |a From materials science to integrated circuit development, much of modern technology is moving from the microscale toward the nanoscale. This book focuses on the fundamental physics underlying innovative techniques for analyzing surfaces and near-surfaces. New analytical techniques have emerged to meet these technological requirements, all based on a few processes that govern the interactions of particles and radiation with matter. This book addresses the fundamentals and application of these processes, from thin films to field effect transistors. |
| 020 | # | # | |a 9781441939807 |
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| 100 | 1 | # | |a Alford, Terry L. |
| 700 | 1 | # | |a Feldman, Leonard C. |
| 700 | 1 | # | |a Mayer, James W., |d 1930- |
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| 650 | # | 7 | |a Thin films |2 inist |
| 650 | # | 7 | |a Capas finas |2 inist |
| 650 | # | 0 | |a Nanostructured materials |
| 653 | # | # | |a Field effect transistors |
| 653 | # | # | |a Transistores de efecto de campo |
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| 856 | 4 | 1 | |u http://campi.cab.cnea.gov.ar/tocs/23229.pdf |3 Indice |
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