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| LEADER |
01435cam#a2200301ua#4500 |
| 008 |
870925s1987####nyua##########100#0#eng## |
| 005 |
20070102134601.0 |
| 001 |
BCCAB008307 |
| 003 |
AR-BCCAB |
| 245 |
1 |
0 |
|a Proceedings of the 30th International Symposium on Electron, Ion, and Photon Beams, 27-30 May 1986, Westin Hotel, Boston, Massachusetts /
|c sponsored by the American Vacuum Society and the IEEE Electron Devices Group ; special editor for the proceedings, Andrew R. Neureuther.
|
| 260 |
# |
# |
|a New York :
|b American Institute of Physics,
|c 1987.
|
| 300 |
# |
# |
|a p. 47-456 :
|b il. ;
|c 30 cm.
|
| 504 |
# |
# |
|a Incluye referencias bibliográficas.
|
| 020 |
# |
# |
|a 0883185172
|
| 111 |
2 |
# |
|a International Symposium on Electron, Ion, and Photon Beams
|n (30th :
|d 1986 :
|c Boston, Mass.)
|
| 700 |
1 |
# |
|a Neureuther, Andrew R.
|
| 710 |
2 |
# |
|a American Vacuum Society.
|
| 710 |
2 |
# |
|a Institute of Electrical and Electronics Engineers.
|b Electron Devices Group.
|
| 080 |
# |
# |
|a 537.533:061.3
|
| 650 |
# |
0 |
|a Photolithography
|v Congresses.
|
| 650 |
# |
0 |
|a Lithography, Electron beam
|v Congresses.
|
| 650 |
# |
0 |
|a Ion beam lithography
|v Congresses.
|
| 650 |
# |
0 |
|a X-ray lithography
|v Congresses.
|
| 650 |
# |
0 |
|a Photoresists
|v Congresses.
|
| 490 |
1 |
# |
|a Journal of Vacuum Science and Technology B ;
|v v. 5, no. 1
|
| 040 |
# |
# |
|a DLC
|c DLC
|d OCL
|b spa
|d arbccab
|
| 942 |
# |
# |
|c BK
|
| 952 |
# |
# |
|2 udc
|7 NOT_LOAN
|a ARBCCAB
|b ARBCCAB
|i 008307_nuevo-0
|o J. VAC. SCI.TECHNOL. 1987
|p 008307_nuevo-0
|t 1
|y BK
|
