Proceedings of the 30th International Symposium on Electron, Ion, and Photon Beams, 27-30 May 1986, Westin Hotel, Boston, Massachusetts /

Proceedings of the 30th International Symposium on Electron, Ion, and Photon Beams, 27-30 May 1986, Westin Hotel, Boston, Massachusetts /

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Detalles Bibliográficos
Autor principal:	International Symposium on Electron, Ion, and Photon Beams (30th : 1986 : Boston, Mass.)
Autor Corporativo:	International Symposium on Electron, Ion, and Photon Beams
Otros Autores:	Neureuther, Andrew R., American Vacuum Society., Institute of Electrical and Electronics Engineers. Electron Devices Group.
Formato:	Sin ejemplares
Lenguaje:
Publicado:	New York : American Institute of Physics, 1987.
Colección:	Journal of Vacuum Science and Technology B ; v. 5, no. 1
Materias:	Photolithography > Congresses. Lithography, Electron beam > Congresses. Ion beam lithography > Congresses. X-ray lithography > Congresses. Photoresists > Congresses.

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