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|a Ion bombardment and ion-assisted etching in rf discharges /
|c Albert Manenschijn.
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| 260 |
# |
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|c 1991.
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| 300 |
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|a 147 p. :
|b il., gráficos ;
|c 24 cm.
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| 502 |
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|a Tesis (doctorado, Ingeniería)--Technische Universiteit van Delft, 1991.
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| 504 |
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|a Incluye referencias bibliográficas.
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| 100 |
1 |
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|a Manenschijn, Albert.
|4 dis
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| 710 |
2 |
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|a Technische Universiteit van Delft
|4 dgg.
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| 650 |
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7 |
|a Ion collisions
|v Theses.
|2 inist
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| 650 |
# |
7 |
|a Colisiones ionicas
|v Tesis.
|2 inist
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| 700 |
1 |
# |
|a Radelaar, S.
|4 ths
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| 040 |
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|a arbccab
|b spa
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| 500 |
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|a Director de tesis: S. Radelaar.
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| 500 |
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|a Incluye índice.
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| 942 |
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|c TS
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| 952 |
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|2 udc
|a ARBCCAB
|b ARBCCAB
|i 13742
|o 537.534.8[043] M313
|p 13742
|t 1
|y TS
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