Ion bombardment and ion-assisted etching in rf discharges /

Ion bombardment and ion-assisted etching in rf discharges /

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Detalles Bibliográficos
Autor principal:	Manenschijn, Albert.
Otros Autores:	Radelaar, S., Technische Universiteit van Delft
Formato:	Libro
Lenguaje:	Inglés
Publicado:	1991.
Materias:	Ion collisions > Theses. Colisiones ionicas > Tesis.

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